Acne / Pores / ScarsA Choice for Faster Improvement: Acne Scar Removal Treatment
A Choice for Faster Improvement: Acne Scar Removal Treatment
Red marks caused by acne often appear as a result of inflammation. Rather than simply waiting for time to pass, it's important to manage them together to prevent inflammation from lingering. KKEUT Clinic combines Genesis Toning with DNA-based injection therapy to help alleviate red marks. *VAT not included
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Treatment Details
What is DNA Acne Scar Injection?
Acne scar injection (Yakchim) is
a treatment that utilizes regenerative ingredients to promote skin recovery and manage residual inflammatory responses,
which can contribute to the calming of red acne marks (PIE).
This Yakchim directly reaches the dermis layer of the skin,
regulating inflammatory responses, supporting the recovery of a weakened skin barrier,
and can also improve redness caused by excessive blood vessel dilation.
Specifically, red marks that persist even after acne inflammation has subsided
are caused by a complex interplay of ‘residual inflammation’ and ‘capillary dilation reaction’.
This injection method focuses on these complex causes.
Rather than simply providing a temporary soothing effect,
it blocks inflammation deep within the skin and induces regeneration processes,
allowing for more effective scar improvement.
What is Genesis Toning (Acne Scar Customized Parameters)?
Using a 1064nm long-pulsed Nd:YAG laser,
it delivers gentle thermal energy deep into the dermis layer of the skin, promoting vascular stability and improving microcirculation.
After the treatment, positive changes in redness, sebum secretion, and pores are expected,
and repeated treatments can help stabilize overall skin heat, flushing, and sensitized skin.
Treatment Cycle Guide
Typically, treatments are recommended at 2-3 week intervals.
Procedure Process Guide
See each step, from your first consultation to completion.
- 01
Confirm skin condition through individual consultation with medical staff.
- 02
Begin personalized treatment.
- 03
Receive necessary post-procedure care and guidance.
Treatment Basics
Treatment time, anesthesia, recovery and how long results last, at a glance.
TIME
10~30 minutes
ANESTHESIA
Almost no pain
RECOVERY
Immediate return to daily life
DURATION
3~6 months
Ideal For
One Fine Difference makes real results.
- KKEUT POINT 01
Those who feel discomfort due to remaining redness after acne inflammation has subsided.
- KKEUT POINT 02
Those who believe their skin's protective barrier has weakened due to frequent skin troubles.
- KKEUT POINT 03
Those who feel their skin has become more sensitive and delicate than usual and needs a recovery process.
Q&A
Answers to the questions we hear most.
Can I apply makeup and wash my face immediately after the treatment?
Yes, you can usually wash your face and apply light makeup without any issues from the day of the treatment.
Is it okay to receive this treatment along with other skin care, laser, or lifting procedures?
It is generally fine to combine it with most other procedures. Especially, combining it with treatments like LDM, which helps calm the skin, can make the process even more comfortable.
Why is it beneficial to combine PDRN injection and Genesis Toning?
The PDRN component has been shown to regulate inflammatory responses and constrict blood vessels. In addition, Genesis Toning with a 1064nm long-pulse wavelength stabilizes micro-circulation in the dermis layer and contributes to improving red marks using thermal energy. When these two treatments are combined, a more positive synergistic effect can be expected for improving red marks caused by acne.
Cautions
Results = Treatment × Aftercare. Please follow the notes below.
For about one week after the procedure, it is advisable to avoid excessive alcohol consumption, smoking, saunas, and high-intensity exercise.
Depending on individual skin condition, there is a possibility of minor bruising appearing in the treated area.
For a few days after the procedure, please temporarily stop using irritating scrubs or exfoliating products.